The 8 inch fused silica reaction tube is engineered for use in high-temperature semiconductor and photovoltaic processing applications, including diffusion, oxidation, LPCVD, and thermal annealing. Made from ultra-pure fused silica, it offers superior thermal stability, exceptional resistance to corrosive gases, and minimal contamination risk—making it ideal for cleanroom-level operations.

Its precisely controlled dimensions and ultra-smooth inner surface ensure uniform gas flow and temperature distribution, promoting consistent wafer processing and high film quality. The tube’s excellent resistance to thermal cycling reduces deformation and extends service life, supporting uninterrupted furnace performance over extended production runs.